http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010041240-A1

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filingDate 2009-08-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_df5fc162e42103f617ecf315cc152dc1
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publicationDate 2010-02-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2010041240-A1
titleOfInvention Focus ring, plasma processing apparatus and plasma processing method
abstract A focus ring of a ring shape is disposed to surround a target substrate on a lower electrode on which the target substrate is mounted in a process chamber. The process chamber receives the target substrate and subjects the received target substrate to a plasma process. At the point of time when the focus ring is first used for the plasma process, a distance between a lower side of an edge portion of the target substrate and a portion of the focus ring facing the lower side of the edge portion of the target substrate is set to be equal to or greater than about 0.4 mm.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10755902-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2022013338-A1
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http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11251026-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2015170925-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-105990084-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2016351378-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10002744-B2
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Total number of triples: 29.