| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1eb9cd2af2f87dcf20b0fbbdfe79996e |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-6708
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25F3-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32115
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32134
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F1-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F1-34 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-306 |
| filingDate |
2009-08-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_eb27528c6e4cd2b7ce6051c8794dc2e6
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_12c53e3f117651c808e89ed8778bf9d9 |
| publicationDate |
2010-02-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2010029088-A1 |
| titleOfInvention |
Modulated metal removal using localized wet etching |
| abstract |
An apparatus for wet etching metal from a semiconductor wafer comprises a wafer holder for rotating a wafer and a plurality of nozzles for applying separate flow patterns of etching liquid to the surface of the wafer. The flow patterns impact the wafer in distinct band-like impact zones. The flow pattern of etching liquid from at least one nozzle is modulated during a total etching time control the cumulative etching rate in one local etch region relative to the cumulative etching rate in one or more other local etch regions. Some embodiments include a lower etch chamber and an upper rinse chamber separated by a horizontal splash shield. Some embodiments include a retractable vertical splash shield used to prevent splashing of etching liquid onto the inside walls of a treatment container. An etch-liquid delivery system includes a plurality of nozzle flow paths having corresponding nozzle flow resistances, and a plurality of drain flow paths having corresponding drain flow resistances. Nozzle flow resistances and drain flow resistances are matched so that switching the flow from a nozzle to a corresponding drain flow path does not change the flow rate of etching liquid through other nozzles. A non-wafer-contacting measuring device measures a metal thickness on a rotating semiconductor wafer during metal wet etching by immersing a plurality of electrodes in etching liquid in close proximity to the wafer surface of the rotating wafer and determining electrical resistance between a plurality of electrodes. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8795482-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8268154-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009120630-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2017034969-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8530359-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9401283-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2008254223-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2023003974-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2014144463-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2020033740-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2015325449-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9447505-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2013244442-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-103560076-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I473911-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11776824-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9121101-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009280649-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8597461-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-110220685-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9735026-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2013255728-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2016086811-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9299593-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2013034966-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2015090303-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2013045606-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8372757-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10014186-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10529588-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2014202987-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-108962788-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-114050118-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2014373881-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9074287-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9074286-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2016351417-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-105088328-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010015805-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8912091-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2014007902-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11670523-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7913643-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-105408983-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8415261-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2011056913-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9527116-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8728338-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2016111296-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8470191-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2727977-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2727977-A4
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2016179023-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-107240561-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2014273497-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9875916-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11784057-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2014110312-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8481432-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2822030-A4
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10551165-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10074559-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9099440-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11467508-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009165709-A1 |
| priorityDate |
2003-10-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |