| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6b822ee046eb6c45d1e3bd9ce9c1782e |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-458
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-66772 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-84
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-78621
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76254 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/A61N5-00 |
| filingDate |
2008-12-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_90a374176e49b6949d98fca23538a820
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_679ab4f2c81a7322b56eff72834cf7c3 |
| publicationDate |
2009-07-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2009179160-A1 |
| titleOfInvention |
Semiconductor substrate manufacturing apparatus |
| abstract |
A semiconductor substrate is manufactured with use of a semiconductor substrate manufacturing apparatus including: a cleaning portion in which a bonding surface of a base substrate, and a bonding surface of a single crystal semiconductor substrate are cleaned, wherein the single crystal semiconductor substrate includes an embrittlement region provided in a region at a predetermined depth from its surface; an electromagnetic wave irradiation portion in which the base substrate and the single crystal semiconductor substrate are attached to each other, the single crystal semiconductor substrate is irradiated with an electromagnetic wave, and the single crystal semiconductor substrate is separated using the embrittlement region as a separation plane, so that a single crystal semiconductor layer separated from the single crystal semiconductor substrate is fixed to the base substrate; and a heat treatment portion in which the single crystal semiconductor layer fixed to the base substrate is subjected to heat treatment. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2014030870-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9214379-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9997394-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9214380-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2017200891-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2013309843-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10043975-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/FR-3007892-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2014207184-A1 |
| priorityDate |
2008-01-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |