http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009127584-A1

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inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_310235b3f68ade0a73dec772f8458eb3
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publicationDate 2009-05-21-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2009127584-A1
titleOfInvention Transistor with a germanium-based channel encased by a gate electrode and method for producing one such transistor
abstract Source and drain electrodes are each formed by an alternation of first and second layers made from a germanium and silicon compound. The first layers have a germanium concentration comprised between 0% and 10% and the second layers have a germanium concentration comprised between 10% and 50%. At least one channel connects two second layers respectively of the source electrode and drain electrode. The method comprises etching of source and drain zones, connected by a narrow zone, in a stack of layers. Then superficial thermal oxidation of said stack is performed so a to oxidize the silicon of the germanium and silicon compound having a germanium concentration comprised between 10% and 50% and to condense the germanium Ge. The oxidized silicon of the narrow zone is removed and a gate dielectric and a gate are deposited on the condensed germanium of the narrow zone.
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Total number of triples: 49.