| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d80f1040809503e54509c871ba828f75 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02274
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3148
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-205
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02167
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-511
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-318
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45565
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76807
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02211
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-347
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76834
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76826
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32706 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-768
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-31
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L23-532
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L23-58
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-314
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-42
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-4763
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G06F19-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-32 |
| filingDate |
2008-09-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_715aac018496ecbf13599f32d6c9f911
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d1e915f8435fcae08d3bc292f65e0779 |
| publicationDate |
2009-04-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2009085172-A1 |
| titleOfInvention |
Deposition Method, Deposition Apparatus, Computer Readable Medium, and Semiconductor Device |
| abstract |
A deposition method includes steps of placing a substrate on a susceptor in a process chamber; supplying to the process chamber a source gas including an organic compound and a plasma gas for facilitating activation of the source gas into plasma; evacuating the process chamber to a reduced pressure; generating plasma of the plasma gas and the source gas in the process chamber to deposit a barrier film including carbon on the substrate; and applying high frequency bias electric power to the susceptor during the plasma generating step. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-106756872-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11251076-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2014225263-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10438844-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2017194229-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2011195580-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9917027-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I423331-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8592324-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10529619-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11670545-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8778810-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8153528-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2011303146-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11587827-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10763161-B2 |
| priorityDate |
2007-09-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |