| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d80f1040809503e54509c871ba828f75 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2924-0002 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76846
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76849
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76843
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-28562
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L23-53238 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L23-52
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-4763 |
| filingDate |
2007-09-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_43a4dc0d31aa6016dc7428009c19f40c |
| publicationDate |
2009-03-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2009065939-A1 |
| titleOfInvention |
Method for integrating selective ruthenium deposition into manufacturing of a semiconductior device |
| abstract |
A method for integrating selective Ru metal deposition into manufacturing of semiconductor devices to improve electromigration and stress migration in bulk Cu. The method includes selectively depositing a Ru metal film on a metallization layer or on bulk Cu using a process gas containing Ru 3 (CO) 12 precursor vapor and a CO gas in a thermal chemical vapor deposition process. A semiconductor device containing one or more selectively deposited Ru metal films is described. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9711449-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010248473-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8242019-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009087982-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10056328-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8716132-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8373273-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-102804373-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8518793-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2016196937-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2584588-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7977235-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7737028-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8178439-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010210108-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010197135-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010081274-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2018125052-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8232200-B1 |
| priorityDate |
2007-09-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |