| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_4d5d546aa6cbfb52c137af7cafc36bf4 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81C2201-0152
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81C2201-0153 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02107
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81C1-00111
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76817
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-316
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y40-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0002
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y10-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02208
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81C1-00031
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3121 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B29C59-16 |
| filingDate |
2006-08-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4f5209c9acf5cabb7309073643541bee
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b9351d85db9e9656639ebe674e1035ae
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a786164eb37b611dd2ced8553151e0d3 |
| publicationDate |
2009-02-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2009039563-A1 |
| titleOfInvention |
Method of forming fine pattern |
| abstract |
A method of fine-pattern formation in which in forming a pattern, a fine pattern formed in a mold can be transferred to a pattering material in a short time at a low temperature and low pressure and, after the transfer of the fine pattern to the patterning material, the fine pattern formed in the patterning material does not readily deform. The method for fine-pattern formation comprises: a first step in which a mold having a fine structure with recesses/protrusions is pressed against a pattering material comprising a polysilane; a second step in which the patterning material is irradiated with ultraviolet to photooxidize the patterning material; a third in which the pressing of the mold against the patterning material is relieved and the mold is drawn from the pattering material; and a fourth step in which that surface of the patterning material to which the fine pattern has been transferred is irradiated with an oxygen plasma to oxidize the surface. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9064827-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8551393-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2007292986-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2010138132-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9073102-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9238309-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2013291890-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2012064302-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2011034012-A1 |
| priorityDate |
2005-08-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |