| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1dfc60ac7715070095a95f9eed92f313
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8e78b3973573217c328881292e7a962d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bd45b670d636cc58a08bfe9fc6f927ee
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_187e846387fceaf2f4a13d5d3f57a3c7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_9602b830f28621c9543e0d80d23c2760
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_9beb1397b3c322d1f77e4f4149b9bc23
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_f4990adbb87daa8efa90d23c8b5042c1 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31053
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1409
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1463 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3105
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C01F17-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08J5-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K3-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14 |
| filingDate |
2008-07-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bfaac1516b2858db6a0563bf2bc312d6
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_42e87fbf7b449aae2ffc847253756756
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6b3e54b41559e407a988ae4eb9e311c2
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_92e32478e86d18d284b1024505071e82
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_aea962da5a378f72ff3cef1a44b93044
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c4fb9e01454786646c52446aa2779a56
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_42e2452fa3f54de1a038ed3f53d89b21 |
| publicationDate |
2008-11-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2008271383-A1 |
| titleOfInvention |
Abrasive, method of polishing target member and process for producing semiconductor device |
| abstract |
To polish polishing target surfaces of SiO 2 insulating films or the like at a high rate without scratching the surface, the present invention provides an abrasive comprising a slurry comprising a medium and dispersed therein at least one of i) cerium oxide particles constituted of at least two crystallites and having crystal grain boundaries or having a bulk density of not higher than 6.5 g/cm 3 and ii) abrasive grains having pores. Also provided are a method of polishing a target member and a process for producing a semiconductor device which make use of this abrasive. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2011275217-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9022834-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8592317-B2 |
| priorityDate |
1997-12-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |