Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d80f1040809503e54509c871ba828f75 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B08B3-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67028 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32862 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-6831 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F1-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-683 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B08B5-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B08B7-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B08B6-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B08B7-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B08B3-12 |
filingDate |
2008-06-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_786a3d48aff89e7d8d2b6200f9d53bb8 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_117319d9441ca022455ce9347c2ae551 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0bdeba161a810bdde0b0cc297a17746f |
publicationDate |
2008-10-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-2008245389-A1 |
titleOfInvention |
Method for cleaning elements in vacuum chamber and apparatus for processing substrates |
abstract |
To clean an element in a vacuum chamber by causing particles sticking to the element to scatter, the present invention uses a means for applying a voltage to the element and causing the particles to scatter by utilizing Maxwell's stress, a means for electrically charging the particles and causing the particles to scatter by utilizing the Coulomb force, a means for introducing a gas into the vacuum chamber and causing the particles sticking to the element to scatter by causing a gas shock wave to hit the element, a means for heating the element and causing the particles to scatter by utilizing the thermal stress and thermophoretic force, or a means for causing the particles to scatter by applying mechanical vibrations to the element. The thus scattered particles are removed by carrying them in a gas flow in a relatively high pressure atmosphere. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-108080355-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8649893-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2011160889-A1 |
priorityDate |
2003-08-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |