http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2008176390-A1

Outgoing Links

Predicate Object
assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_88fc7f9eb617072238851d46591a0c76
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0228
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-36
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-6656
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02167
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-6659
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02216
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02211
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-7833
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3185
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3205
filingDate 2008-03-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_aea2402ee5304455266c1834627bfff2
publicationDate 2008-07-24-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2008176390-A1
titleOfInvention Method of forming carbon-containing silicon nitride layer
abstract A method for forming a carbon-containing silicon nitride layer with superior uniformity by low pressure chemical vapor deposition (LPCVD) using disilane, ammonia and at least one carbon-source precursor as reactant gases is provided.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I547995-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010062592-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9018108-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10153277-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9991360-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2012135363-A3
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010098884-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2012135363-A2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8563090-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9306050-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2017221893-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8791034-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20170091432-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102482877-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2011005433-A3
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2011005433-A2
priorityDate 2005-09-13-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2005109276-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2005158983-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7148143-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7371649-B2
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID297
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID6535
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID222
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419524028
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419485362
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID6547
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID123185
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID416024473
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID3084099
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419516414
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559581
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID24811
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID457160489
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID457277700
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID586279
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419520721
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID16682925
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419522015
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID9009
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID414859283
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419550829
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID74123

Total number of triples: 61.