Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1a492183be65153abfa7dec00d51c816 |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0338 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-70341 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0338 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0274 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C1-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C5-00 |
filingDate |
2007-05-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ec72e12d4077c325ad02dc88ccb08bb3 |
publicationDate |
2008-07-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-2008166661-A1 |
titleOfInvention |
Method for forming a fine pattern in a semiconductor |
abstract |
A method for forming a fine pattern in a semiconductor device includes the steps of: coating a first photoresist composition over a semiconductor substrate including an underlying layer, thereby forming a first photoresist film; exposing and developing the first photoresist film, thereby forming a first photoresist pattern; forming a second photoresist film that does not react with the first photoresist pattern over the resulting structure; and exposing and developing the second photoresist film, thereby forming a second photoresist pattern; wherein the first and second photoresist patterns each comprise a plurality of elements, and individual elements of the second photoresist pattern are located between adjacent individual elements of the first photoresist pattern. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2016085150-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2013196441-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8142964-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2014363984-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010021827-A1 |
priorityDate |
2007-01-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |