| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_241194de359d4613f8c0bec5bcf67184
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_4b57d4d15b61c66cf1ed62e4714e7649
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_be1462ebb0cffd1cbec02760046ed36a |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02E10-50 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L31-0236
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L31-02363
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L31-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L31-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-306
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C30B33-10 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-306
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L31-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L31-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K13-02 |
| filingDate |
2005-10-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1f950a89251eee7f233d9cf5707f4369
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_54b4a07d55d44ca62a9e8e1f28f106a6
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1e8c3842e431608118d4ae57d870ecc6 |
| publicationDate |
2008-02-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2008048279-A1 |
| titleOfInvention |
Process for Producing Semiconductor Substrate, Semiconductor Substrate for Solar Application and Etching Solution |
| abstract |
Provided is: a process for producing safely at low cost a semiconductor substrate excellent in photoelectric transduction efficiency, in which a fine uneven structure suitable for a solar cell can be formed uniformly with desired size on the surface of the semiconductor substrate; a semiconductor substrate for solar application in which a uniform and fine pyramid-shaped uneven structure is provided uniformly within the surface thereof; and an etching solution for forming a semiconductor substrate having a uniform and fine uneven structure. A semiconductor substrate is etched with the use of an alkali etching solution containing at least one kind selected from the group consisting of carboxylic acids having a carbon number of 1 to 12 and having at least one carboxyl group in a molecule, and salts thereof, to thereby form an uneven structure on the surface of the semiconductor substrate. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010239818-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009227115-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8940178-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-102013211231-B4
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-102918653-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010102351-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-103560170-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9673342-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-102008014166-B3 |
| priorityDate |
2004-10-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |