| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_4d60cbaf3bf845c902d1d075f29c0fcb |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-31504
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-31551
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-249953 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-304
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24D3-28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B37-24 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B32B27-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B32B9-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B32B3-26 |
| filingDate |
2006-05-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3505bda54cab6d0addf26fd32d4c8873 |
| publicationDate |
2007-11-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2007275226-A1 |
| titleOfInvention |
Chemical mechanical polishing pad |
| abstract |
The invention provides a polishing pad suitable for planarizing at least one of semiconductor, optical and magnetic substrates. The polishing pad includes a polymeric matrix having a top polishing surface. The top polishing surface has polymeric polishing asperities or forms polymeric polishing asperities upon conditioning with an abrasive. The polymeric polishing asperities are from a polymeric material having at least 45 weight percent hard segment and a bulk ultimate tensile strength of at least 6,500 psi (44.8 MPa). And the polymeric matrix has a two phase structure, a hard phase and a soft phase with an average area of the hard phase to average area of the soft phase ratio of less than 1.6. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10065286-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8822339-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8602846-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2008305720-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2008132030-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8318298-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2011049318-A3
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10625392-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2151299-A3
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8476328-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9156124-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2011151240-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2012009855-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2019308294-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010317263-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11396081-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010009611-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9126303-B2 |
| priorityDate |
2006-05-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |