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publicationDate 2007-10-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2007243720-A1
titleOfInvention UV treatment for low-k dielectric layer in damascene structure
abstract An UV treatment for making a low-k dielectric layer having improved properties in a damascene structure. A low-k dielectric layer in a damascene structure is subjected to an UV treatment with He gas or H 2 gas to eliminate etching damage to the exposed surfaces of the low-k dielectric layer.
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