| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6fb7a3f314c77f44e7f2f4dfbc46364f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_990102f6702a9745662359b51ae4eacf
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6210d51ba69020fa18a86a5226e922a8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_03cc676cd4d526ec7db9fd71cce9f5b7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_48a61065f04792be0b45dcfe95d4675e |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4405 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-44
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B08B5-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B08B3-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 |
| filingDate |
2005-03-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0fdee55b8b77cd49dba1a2cdda3c0960
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_44f97e245b38d40cf4242a709d0ad38b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fe9e747c2341e6f28af7fa79b73f22c6
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8877b1c2484d30113e0ddc2033fea9cc
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_41b3b1dcc02b86fb1bcade691817848a |
| publicationDate |
2007-09-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2007209677-A1 |
| titleOfInvention |
Self-Cleaning Catalytic Chemical Vapor Deposition Apparatus And Cleaning Method Thereof |
| abstract |
Provided is a self-cleaning catalytic chemical vapor deposition apparatus which suppresses the corrosion-induced degradation of a catalytic body by a cleaning gas without heating a catalytic body to not less than 2000° C. and permits practical cleaning rates and good cleaning at low cost. With conductors 5 a, 5 b which supply a constant current to a catalytic body 4 within a reaction chamber 2 from a heating power supply 6 and terminals 6 a, 6 b of the heating power supply 6 kept electrically insulated from the reaction chamber 2, a cleaning gas containing halogen elements is introduced into the reaction chamber 2 which has been evacuated, and the catalytic body 4 is heated by the energization from the heating power supply 6. An active species generated by this heating is caused to react with an adhering film which adheres to the interior of the reaction chamber 2, whereby the adhering film is removed. During this removal of the adhering film, a DC bias voltage having an appropriate polarity and an appropriate value is applied from a constant-voltage power supply 8 to the conductor 5 b of the heating power supply 6. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2007145297-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2007145296-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2012190176-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-114369812-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2485248-A4
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7504643-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7495239-B2 |
| priorityDate |
2004-03-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |