http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2007161146-A1

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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-00
filingDate 2006-12-15-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cd38268269a633a7f449ca9919cdcc64
publicationDate 2007-07-12-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2007161146-A1
titleOfInvention Method for Manufacturing Image Sensor
abstract A method of manufacturing an image sensor using a microlens mold is provided. The method includes: forming an interlayer dielectric layer on a semiconductor substrate having photodiodes; forming color filter layers on the interlayer dielectric layer; forming a planarization layer on the color filter layers; coating photoresist on the planarization layer; aligning a mold having a lens shaped pattern on the semiconductor substrate with the photoresist applied thereon; pressing the mold and the semiconductor substrate closely to each other such that a pattern formed in the mold is transferred onto the photoresist; and separating the mold from the semiconductor substrate, thereby forming micro-lenses.
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http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2008157154-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2015111393-A1
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priorityDate 2005-12-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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Total number of triples: 30.