| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G14-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0236
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G8-10 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G14-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-023
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G8-10 |
| filingDate |
2004-02-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7449f7938ca9fd8dbfe4a8cb0cf75111
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_042dbdedb708cde8839f4a19296a08fa
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0d839018f8ce1e1df25ebb714379d4ab
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_918b29368c80a2d3b7671d4534129f20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c8712f538fccc6b53e61d3b4fec6e46e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7f08ea87295ed56b59dae70df070c234 |
| publicationDate |
2004-08-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2004167312-A1 |
| titleOfInvention |
Phenol novolak resin, production process thereof, and positive photoresist composition using the same |
| abstract |
A phenol novolak resin has a peak intensity ratio of ortho-ortho bond (o-o)/ortho-para bond (o-p)/para-para bond (p-p) in a resin structure not substantially varying in each molecular weight fraction and has a weight average molecular weight (Mw) of 3000 to 20000 in terms of polystyrene, which peak intensity ratio is detected by 13 C-NMR analysis. The phenol novolak resin can form both dense pattern and isolation pattern with good shapes in the formation of a fine resist pattern of not more than 0.35 μm and has satisfactory sensitivity, definition, and focal depth range properties, and has a resin composition being uniform in each molecular weight fraction. A process for producing the phenol novolak resin, and a positive photoresist composition using the resin are also provided. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009017399-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7582407-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7683155-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7456044-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2007112168-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2006241276-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2007161146-A1 |
| priorityDate |
2000-02-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |