| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d80f1040809503e54509c871ba828f75 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45544
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4412
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4401
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-34 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-31
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-455
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-34
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-44 |
| filingDate |
2007-03-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cbe4bac17f0a1af705c4688f098ac2f8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d1216cd9e0b6675edb9350f77f7921df
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5665be64c609584a58722d9d78606bc6
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1f3c7f6c1d1e7355c33f019c21c0a0c8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_00bd01cc4f33b0c347e6c92559642e35
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cfba0211aafaddf8d9dd2afb0d7f744c |
| publicationDate |
2007-07-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2007160757-A1 |
| titleOfInvention |
Processing method |
| abstract |
In a processing apparatus which performs a film deposition by alternately supplying a plurality of source gases, the source gases are prevented from reacting within an exhaust pipe so as to prevent the exhaust pipe from clogging due to a reaction by-product. A gas supply to a processing container is switched between a TiCl 4 supply system and a NH 3 supply system. Additionally, a gas exhaust from the processing container is switched between a TiCl 4 exhaust system and a NH 3 exhaust system. The gas exhaust is switched to the TiCl 4 exhaust system when the gas supply is switched to the TiCl 4 supply system, and the gas exhaust is switched to the NH 3 exhaust system when the gas supply is switched to the NH 3 supply system. The switching is performed by a stop valve provided to each of the supply system and the exhaust system. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2013237063-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11371142-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11081321-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10808315-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2005221004-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2006270223-A1 |
| priorityDate |
2002-10-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |