http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2007074970-A1

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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-00
filingDate 2006-09-19-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_685c6a1692291fdfcfda12132a564fa5
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_29cf277545729b49acbc44357fa3c1e5
publicationDate 2007-04-05-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2007074970-A1
titleOfInvention Device and method of manufacturing sputtering targets
abstract The present invention comprises an apparatus for manufacturing a sputtering target that has a crucible for holding a liquid material. The crucible has a discharge opening. A positioning mechanism is mounted adjacent the crucible. A substrate is held by the positioning mechanism. The positioning mechanism moves the substrate such that the material is deposited onto the substrate. A method of manufacturing a sputtering target is also disclosed. The method includes melting an material and discharging the material through a nozzle. A substrate is moved adjacent the nozzle such that the material is deposited onto the substrate.
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priorityDate 2005-09-20-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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