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filingDate 2006-10-12-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2007-02-08-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2007032048-A1
titleOfInvention Method for depositing thin film by controlling effective distance between showerhead and susceptor
abstract A method for depositing a thin film on a substrate by plasma CVD includes: providing a vacuum chamber including a showerhead and a susceptor entirely facing the showerhead in parallel, placing a substrate on the susceptor entirely within the inner portion; and applying an RF power between the showerhead and the susceptor to deposit a thin film on the substrate. The susceptor includes an inner portion and a peripheral portion that is defined as any portion enclosing the inner portion and defines an electrically effective distance from the showerhead greater than that defined by the inner portion.
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