Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bce787970b69aeb08d159e7c101c9ed7 |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G05B2219-45212 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G05B2219-45031 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G05B2219-32182 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G05B2219-37398 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02P90-02 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L22-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G05B19-41875 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32935 |
classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01L21-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G05B19-418 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01R31-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01R31-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-66 |
filingDate |
2006-09-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0bf25c07e6074897bee5b5391ecb6ad3 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3643c329432de8535ec62bad0ad1d8b8 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d06ce2c90e9f239f9b0e27dfef5518db |
publicationDate |
2007-01-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-2007017896-A1 |
titleOfInvention |
Method for controlling a process for fabricating integrated devices |
abstract |
A method for controlling a process for fabricating integrated devices on a substrate. The method includes ex-situ and in-situ measurements of pre-etch and post-etch dimensions for structures formed on the substrate and uses the results of the measurements to adjust process recipes and to control the operational status of etch and external substrate processing equipment. In one exemplary application, the method is used during a multi-pass process for fabricating a capacitive structure of a trench capacitor. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2014070748-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9356822-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10101721-B2 |
priorityDate |
2003-04-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |