| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bce787970b69aeb08d159e7c101c9ed7 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-35
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3408 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-00 |
| filingDate |
2005-06-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_042671c6dd9dcf35ba27d07bf9b7fbac
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_016d9455299b67351ad8b4b7e2cd0d09 |
| publicationDate |
2006-12-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2006289291-A1 |
| titleOfInvention |
Method for adjusting electromagnetic field across a front side of a sputtering target disposed inside a chamber |
| abstract |
A physical vapor deposition chamber, which includes a sputtering target, a magnetron disposed on a back side of the sputtering target, a metal sheet disposed between at least a portion of the magnetron and the sputtering target to reduce the effect of the magnetic strength of the portion of the magnetron on the sputtering target and a substrate support for holding a substrate. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-102789941-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11244815-B2 |
| priorityDate |
2005-06-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |