| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_41cba0d201562246a0d551def0187f39
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_243db5498118a6f5bb6004a83618eede
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_b0c218037ed25dcef4764d297aad1f58 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2022 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C5-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-00 |
| filingDate |
2005-05-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dcb18a259160b442473b8f0136531634
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_70e398d42c86d697d871466be11cfb53
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f772cbb58b21ba90d982d177bd6d1ddd |
| publicationDate |
2006-11-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2006257749-A1 |
| titleOfInvention |
Method for reducing critical dimension |
| abstract |
A method for reducing critical dimension is provided. An exposure process and a develop process are performed on a photoresist layer. An optical trim exposure process is performed between the exposure process and the development process or before the exposure process. The optical trim expsoure process is performed to expose the photoresit layer by using a fully open mask of which the transmission rate is greater than zero. Because of the performance of the optical trim exposure process, the critical dimension of the photoresist layer can be reduced without substantially changing the characteristics of the photoresist layer. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2006223203-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7547561-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8137893-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9996008-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9209035-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2011129652-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7862982-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9583344-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-103186038-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009311490-A1 |
| priorityDate |
2005-05-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |