Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_38ed56a4b4e8e2315b2b3308bffedb3f |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-38 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C5-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-00 |
filingDate |
2005-04-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_678acc16449e27db4cefb5f7669058e5 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7e23e7bd0fff1347e33edb203d291805 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_991992861407b793d7b91f387bd4d0f8 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9b6a80c1fed52bd0cda277753597eb8a http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7552405e7eb4fe2e1c48cde52b9001bb |
publicationDate |
2006-11-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-2006246357-A1 |
titleOfInvention |
System and method for manufacturing a mask for semiconductor processing |
abstract |
The present disclosure provides a system and method for manufacturing a mask for semiconductor processing. In one example, the system includes at least one exposure unit configured to select a recipe for a later baking process in a post treatment unit, a buffer unit coupled to the exposure unit and configured to move the mask substrate from the exposure unit to the post treatment unit without exposing the mask substrate to the environment; and the post treatment unit coupled to the buffer unit and the exposure unit and configured to perform a baking process on the mask substrate using baking parameters associated with the recipe selected by the exposure unit. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8784672-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7789576-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7633601-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2012148944-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2007215040-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2008241760-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-3285281-A4 |
priorityDate |
2005-04-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |