http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2006246357-A1

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filingDate 2005-04-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_678acc16449e27db4cefb5f7669058e5
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7e23e7bd0fff1347e33edb203d291805
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publicationDate 2006-11-02-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2006246357-A1
titleOfInvention System and method for manufacturing a mask for semiconductor processing
abstract The present disclosure provides a system and method for manufacturing a mask for semiconductor processing. In one example, the system includes at least one exposure unit configured to select a recipe for a later baking process in a post treatment unit, a buffer unit coupled to the exposure unit and configured to move the mask substrate from the exposure unit to the post treatment unit without exposing the mask substrate to the environment; and the post treatment unit coupled to the buffer unit and the exposure unit and configured to perform a baking process on the mask substrate using baking parameters associated with the recipe selected by the exposure unit.
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http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7789576-B2
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http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2012148944-A1
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priorityDate 2005-04-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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Total number of triples: 32.