| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d80f1040809503e54509c871ba828f75 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32055
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-8234
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76877 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-8234 |
| filingDate |
2005-01-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cd5d18d422d8ad50bd0e9aff0eda90d2
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d740083bd9447927db5585d96fe4296b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5d96c588bde5c758253be5261ff9912b |
| publicationDate |
2006-07-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2006160288-A1 |
| titleOfInvention |
Micro-feature fill process and apparatus using hexachlorodisilane or other chlorine-containing silicon precursor |
| abstract |
A method is provided for depositing a silicon-containing film in a micro-feature on a substrate by a low pressure deposition process in a processing system. A silicon-containing film can be formed in a micro-feature by providing a substrate in a process chamber of a processing system, and exposing a hexachlorodisilane (HCD) process gas to the substrate. A processing tool containing a processing system for forming a silicon-containing film in a micro-feature using a silicon and chlorine-containing gas such as a HCD process gas is provided. Alternatively, the micro-feature can be exposed to DCS, SiCl 4 , and SiHCl 3 gases. Alternatively, the micro-feature can be exposed to (SiH 4 +HCl). |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9620356-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009020140-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9396929-B2 |
| priorityDate |
2005-01-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |