abstract |
An object of the present invention is to provide a ceramic heater making it possible to make the temperature of a face for heating a silicon wafer even and prevent damage of the silicon wafer. The ceramic heater of the present invention is a ceramic heater comprising resistance heating elements formed on a surface of a ceramic substrate in a disc form or inside the ceramic substrate, wherein the resistance heating elements composed of two or more circuits being divided in the circumferential direction are arranged in the outermost periphery of the ceramic substrate and further the resistance heating element composed of a different circuit is formed in the inner portion of the resistance heating elements being arranged in the peripheral portion. |