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publicationDate 2004-07-22-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2004142836-A1
titleOfInvention Resist and etching by-product removing composition and resist removing method using the same
abstract A resist removing composition having a superior capability for removing a resist, polymer, organometallic polymer and etching by-products such as metal oxide, which does not attack underlying layers exposed to the composition and which does not leave residues after a rinsing step. The resist removing composition contains alkoxy N-hydroxyalkyl alkanamide and a swelling agent.
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