| Predicate |
Object |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0236
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0233
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-095
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-26 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-023
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-095 |
| filingDate |
2002-11-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0991bd7946508868213dfe1c1011187f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_66fc32f2789223fce85f7e9d7a5da2ad
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c6b7ca059324433397252fc461cf46a1
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e379dd6dd267305175a10db770748518
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_43c81962429826a53e30c804ac603453 |
| publicationDate |
2004-07-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2004131963-A1 |
| titleOfInvention |
Two-layer film and method of forming pattern with the same |
| abstract |
The invention concerns a lift-off process for patterning layers that are deposited and/or sputtered. The invention provides a two-layer resist and a patterning method using the resist. The patterning method can readily produce burr-free layers on a substrate. n The method comprises the steps of: n sequentially applying positive radiation-sensitive resin compositions 1 and 2 to form a two-layer laminate; n subjecting the two-layer resist to single exposure and development to produce fine patterns having an undercut cross section; n depositing and/or sputtering an organic or inorganic thin layer with use of the resist pattern as a mask; and n lifting off the resist pattern to leave a pattern of the thin layer in desired shape. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8492067-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2905657-A4
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7914693-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2008035059-A2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2012129106-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2021216014-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2007158872-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2008035059-A3
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1785770-A3
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1785770-A2 |
| priorityDate |
2002-01-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |