http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2004131796-A1

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classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-482
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-48
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-318
filingDate 2003-10-02-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_eeb08af80245863b04b55cd8ffd5e33d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9ff42fc9fb5e53ef71c091cb57b3d323
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5382a61dffcdf19d50d88f28deb69949
publicationDate 2004-07-08-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2004131796-A1
titleOfInvention Method of fabricating a protective film by use of vacuum ultraviolet rays
abstract In a method of fabricating a protective film, a vacuum ultraviolet radiation CVD (Chemical Vapor Deposition) system is provided. The system includes a vacuum ultraviolet rays generator, a reactor provided with a platform for supporting a substrate, a heat retainer provided on the platform, and a window separating the vacuum ultraviolet rays generator from the reactor. Then, an organic stock gas is fed from a gas feeder into the reactor while retaining temperature of the substrate at a low temperature with the heat retainer. Simultaneously, the reactor is irradiated with vacuum ultraviolet rays from the vacuum ultraviolet rays generator through the window.
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http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010022072-A1
priorityDate 2002-10-02-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 43.