Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2fadcae3196ca725b795713aa49cd9f1 |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G11B5-3163 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K13-00 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K13-00 |
filingDate |
2003-09-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_59ecba6c2dd6b734d1ec650f596e437c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d7ec7bf1e404f4de88409deadf53d97a |
publicationDate |
2004-04-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-2004061092-A1 |
titleOfInvention |
Wet etch for selective removal of alumina |
abstract |
The present invention generally relates to an improvement in the process for etching of alumina. The novel wet etchant solution combines complexing agents with pH control to achieve improved selectivity for etching of alumina in the presence of transition metals. The novel wet etchant provides improved etching of features in alumina during fabrication of thin film magnetic structures over the non-selective conventional dry etching processes. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010213163-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2020234395-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2016186100-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11319508-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2019110680-A2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8080167-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-4245834-A2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-3976746-A4 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-114144508-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9406324-B1 |
priorityDate |
2002-09-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |