Predicate |
Object |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76838 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-7684 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76843 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32136 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76865 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76862 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F4-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32115 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-44 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F4-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3213 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-321 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-768 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 |
filingDate |
2002-09-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6def990f5cc66abf5509c0375ffeda9a http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8ce7c5c38cc2c1fc87f22f5c16ec0676 |
publicationDate |
2004-03-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-2004058528-A1 |
titleOfInvention |
Selective dry etching of tantalum and tantalum nitride |
abstract |
The invention describes a method for the selective dry etching of tantalum and tantalum nitride films. Tantalum nitride layers ( 30 ) are often used in semiconductor manufacturing. The semiconductor substrate is exposed to a reducing plasma chemistry which passivates any exposed copper ( 40 ). The tantalum nitride films are selectively removed using an oxidizing plasma chemistry. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010012153-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2005158999-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7094705-B2 |
priorityDate |
2002-09-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |