| Predicate |
Object |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-111
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-108
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-106 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0395
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 |
| filingDate |
2001-11-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9dc12a886639e573e235a17fec6d07bb
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a3f1754cf2075b84119ba42ae5cd2822 |
| publicationDate |
2004-02-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2004038151-A1 |
| titleOfInvention |
Multilayer elements containing photoresist compositions and their use in microlithography |
| abstract |
A photoresist element comprising a substrate; an etch resistant layer; and at least one photoresist layer prepared from a photoresist composition comprising a polymer selected from the group consisting of: (a) a fluorine-containing copolymer comprising a repeat unit derived from at least one ethylenically unsaturated compound characterized in that at least one ethylenically unsaturated compound is polycyclic; (b) a branched polymer containing protected acid groups, said polymer comprising one or more branch segment(s) chemically linked along a linear backbone segment; (c) fluoropolymers having at least one fluoroalcohol group having the structure: —C(R f )(R f ′)OH, wherein R f and R f ′ are the same or different fluoroalkyl groups of from 1 to about 10 carbon atoms or taken together are (CF 2 )n wherein n is 2 to 10; (d) amorphous vinyl homopolymers of perfluoro(2,2-dimethyl-1,3-dioxole) or CX 2═ CY 2 where X═F or CF 3 and Y═—H or amorphous vinyl copolymers of perfluoro(2,2-dimethyl-1,3-dioxole) and CX 2═ CY 2 ; and (e) nitrile/fluoroalcohol-containing polymers prepared from substituted or unsubstituted vinyl ethers; and (B) at least one photoactive component. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8021650-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2007203311-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8796484-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2003157430-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2007202069-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6800418-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7521514-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2007232769-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9522998-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2015064909-A1 |
| priorityDate |
2001-11-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |