| abstract |
An apparatus for processing a workpiece with a plasma includes a plasma chamber having an interior processing space, a plasma generating assembly, a gas supply system communicated to the chamber and operable to supply one or more gasses to the processing space, and a vacuum system communicated to the chamber and operable to remove gas from the chamber. A magnet assembly having a plurality of magnets and being constructed and arranged to hold the plurality of magnets in a predetermined configuration is rotatably mounted within the chamber so that the plurality of magnets are positioned to impose a magnetic field on a plasma within the processing space. |