| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e96f3ee1454ffb6578f653ba5b9af958 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-6708 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31058
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3122
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02222
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02282
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-122
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3125
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31053
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-1212
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02343
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02211
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02126 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-00 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-316
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-312
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3105
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-31
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-306
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C18-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-768 |
| filingDate |
2002-09-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_00bd99a424413acf0b29fb648a92df73
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d904054332b02568e609a68787ace96f |
| publicationDate |
2003-04-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2003062599-A1 |
| titleOfInvention |
Process for producing semiconductor substrates and semiconductor substrates |
| abstract |
A process for producing semiconductor substrates with a coating film having an excellent chemical resistance with a high yield and an excellent production reliability without any development of cracks and any generation of foreign matters due to a projected portion of the coating film is described, which includes the steps of: n (a) forming a coating film by coating an insulating film-forming coating liquid on a substrate mounted on a rotating disc of a spin coater according to a spin coating method; and then n (b) removing a projected portion of the coating film formed at the periphery of the substrate by ejecting a solvent through a nozzle moving from any point on a line drawn between the periphery edge and the center of the substrate toward the periphery edge while rotating the substrate. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2011070680-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7554171-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2008128870-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8736029-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2005176254-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2012328728-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8728943-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2015115550-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9202722-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9897918-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7851363-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9601331-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2011204490-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7045446-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8614500-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2013105933-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2005003570-A1 |
| priorityDate |
2001-09-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |