http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2003031792-A1

Outgoing Links

Predicate Object
assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bce787970b69aeb08d159e7c101c9ed7
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4581
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-458
filingDate 2001-07-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7c4f51ab5312a3b628065baa5ccc5a34
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_511997785a4668446381b72e63c27ea2
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6c6dad123aba30d3089cece6ba62ba0d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_620122497948d2d5067e767333092382
publicationDate 2003-02-13-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2003031792-A1
titleOfInvention Reduction of electrostatic charge on a substrate during PECVD process
abstract Provided herein is a method of reducing an electrostatic charge on a substrate during a plasma enhanced chemical vapor deposition process, comprising the step of depositing a conductive layer onto a top surface of a susceptor support plate disposed within a deposition chamber wherein the conductive layer dissipates the electrostatic charge on the bottom surface of the substrate during a plasma enhanced chemical vapor deposition process. Also provided are a method of depositing a thin film during a plasma enhanced chemical vapor deposition process using the methods disclosed herein and a conductive susceptor.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9455152-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2016122506-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2008194169-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2016322215-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7959735-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9859088-B2
priorityDate 2001-07-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5997685-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6120660-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5514623-A
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID74123
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID5461123
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID458434260
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID70435
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID70434
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID457707758
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559541
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419544406
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID783
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419544403
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID24404
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419520721
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID425193155
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID23953
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID24261
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID128952217
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID457773519

Total number of triples: 40.