http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2002179015-A1
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32247 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-321 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32 |
| filingDate | 2001-05-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9d582b2d21d08eb4643936d0ab7150e0 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fa541994d77832628121ba0e84d9eb2a |
| publicationDate | 2002-12-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | US-2002179015-A1 |
| titleOfInvention | Plasma etching system |
| abstract | A plasma etching equipment ( 5 ) is proposed for especially anisotropic etching a substrate ( 13 ) by the action of a plasma ( 21 ). For this purpose, a first, especially inductively coupled plasma-generating device ( 31 ) is provided, which has a first means ( 11 ) for generating a first high-frequency electromagnetic alternating field, an etching chamber ( 10 ) for generating a first plasma ( 21 ) from reactive particles by the action of the first high-frequency electromagnetic alternating field upon a first reactive gas with the substrate ( 13 ) to be etched, and a first gas supply ( 22 ). A second plasma-generating device ( 32 ) is preconnected to this first plasma-generating device ( 31 ), and it has a second means ( 20 ), especially a microwave generator ( 20 ), for generating a second high-frequency electromagnetic alternating field, a plasma-generating region ( 33 ) for generating a second plasma ( 18 ) from reactive particles by the action of the second high-frequency electromagnetic alternating field upon a second reactive gas, and a second gas supply ( 16 ). In this connection, the generated second plasma ( 18 ) of the first plasma-generating device ( 31 ) can be supplied at least partially as first reactive gas via the first gas supply ( 32 ). |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7491649-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6784620-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2005159010-A1 |
| priorityDate | 2000-05-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 28.