| abstract |
Polymeric compounds for use in a chemically amplified resist are represented by the following chemical formulas 1 and 2: n n n wherein R 1 and R 2 , which may be identical or different, are each selected from the group consisting of —H and —CH 3 ; R 3 and R 4 , which may be identical or different, are each selected from the group consisting of —H, —CH 3 and —CH 2 CH 3 ; and 0.1≦m≦0.9 and 0.1≦n≦0.9, with the equation of m+n=1. n n n wherein R 3 , R 4 , and R 5 , which may be identical or different, are each selected from the group consisting of —H and —CH 3 ; R 6 and R 7 , which may be identical or different, are each selected from the group consisting of —H, —CH 3 and —CH 2 CH 3 ; R 8 is —CH 3 or —CH 2 CH 2 OH; and 0.1≦p≦0.9, 0.05≦q≦0.8, and 0.05≦r≦0.5, with the equation of p+q+r=1. Also disclosed are resist compositions comprising the polymeric compounds and photoacid generators. |