| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fd7ced27fb6803417c04372039411cda |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-1608
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08K2003-2262
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K2109-00 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L1-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08K3-013
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08K5-19
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02024
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-30625
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K109-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K3-22 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K3-013
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09G1-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L1-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-19 |
| filingDate |
2017-08-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2022-05-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ef4e756fe28bc438bb40e1a2e4cefe1d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dab42468db56da6ff050ae7ddf78e985
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_90e100a6a920c51930cd6984f9a9224b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_10a4abfef1e4ea948e2e2a29ab2cadf9 |
| publicationDate |
2022-05-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-11339309-B2 |
| titleOfInvention |
Polishing liquid and polishing method |
| abstract |
A polishing liquid is provided containing manganese oxide abrasive grains, permanganate ions, and a cellulosic surfactant or a cationic surfactant. The polishing liquid has a pH of 5 or more and 11 or less. The cellulosic surfactant is preferably a carboxymethyl cellulose or a derivative thereof. The cationic surfactant preferably has a quaternary ammonium ion site. The content of the cellulosic surfactant or the cationic surfactant is preferably 0.01 mass % or more and 1.0 mass % or less based on the total amount of the polishing liquid. |
| priorityDate |
2016-12-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |