http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11171011-B2

Outgoing Links

Predicate Object
assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8cf8d77ac0eff1767b22d2fb9445b64d
classificationCPCAdditional http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-334
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32449
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31116
classificationIPCAdditional http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-311
filingDate 2018-08-21-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2021-11-09-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0b27f061ca5477550bbe6bec986cf2b6
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_796cf69dd820ee1050a471bcbf9e53f0
publicationDate 2021-11-09-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-11171011-B2
titleOfInvention Method for etching an etch layer
abstract A method of forming a feature in a stack comprising a dielectric material on a substrate is provided. An etch plasma is generated from an etch gas, exposing the stack to the etch plasma and partially etching the feature in the stack. The stack is primed. A protective film is deposited on sidewalls of the feature by repeating for a plurality of cycles the steps of exposing the stack to a first reactant, allowing the first reactant to adsorb onto the stack, and exposing the stack to a second reactant, wherein the first and second reactants react with one another to form the protective film over the stack. The etching, priming, and depositing a protective film are repeated until the feature is etched to a final depth.
priorityDate 2018-08-21-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2016343580-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2012108079-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2013021192-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2016268141-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20170092645-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9384998-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2017178920-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20170132671-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2013229351-A
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID407330845
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID3084169
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559526
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559477
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419523291
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID947
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID425193155
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID783
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID977
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID23964
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID66072
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID410534446
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419491804
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID416641266
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID24553
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID411556313
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID11638
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559585
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID23963
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID402
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID425762086
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419527022
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419546360
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID10039
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID23950
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419558793
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419523397
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID5462311
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419556970
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419577474
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID23956
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID17358
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID23986
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID5359268

Total number of triples: 60.