| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bce787970b69aeb08d159e7c101c9ed7 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2224-85017 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3255
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32357
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3233
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32422
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67213 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-67 |
| filingDate |
2019-10-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2021-08-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2df874194d9a583c0f3b5db1f7d9f002
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a75373c36614b2110d757589abe8fcca
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f6a96e822cca8a6563d3fe23a2e4566d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c2893106f24971f74d947b3714fde448
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e9ec0b055d14dd615324a182a5944f21
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_eb1026becf63a47739870098e3e77ba4 |
| publicationDate |
2021-08-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-11101113-B2 |
| titleOfInvention |
Ion-ion plasma atomic layer etch process |
| abstract |
A method of etching uses an overhead electron beam source that generates an ion-ion plasma for performing an atomic layer etch process. |
| priorityDate |
2015-03-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |