http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10730082-B2
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_da1568abf4abdfb458e0e2b839d41d40 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32513 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4405 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32458 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B08B7-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32862 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B08B7-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-44 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32 |
| filingDate | 2016-10-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2020-08-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6e05fe56cd030270843819b76f5cf1cb http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9a232ad9e4b68b93749bda608ef1b5e5 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9f6fb69e9b05c3cdb71f4175200db6c3 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9de2714e8b709359382ade7accdec780 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f52fb0a5ee02361758fe594a13996a50 |
| publicationDate | 2020-08-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | US-10730082-B2 |
| titleOfInvention | Apparatus and method for differential in situ cleaning |
| abstract | A workpiece processing apparatus allowing in situ cleaning of metal deposited formed on the extraction plate and in the plasma chamber is disclosed. The apparatus includes an extraction plate having an extraction aperture through which the sputtering material is passed. The apparatus also includes a sealed volume disposed within the plasma chamber which is in communication with a cleaning aperture on the extraction plate. The sealed volume is in communication with a cleaning gas, which is excited by the plasma in the plasma chamber, and can be used to clean the exterior surface of the extraction plate. The feed gas used in the plasma chamber can be selected from a sputtering species and the cleaning gas. Since the volume in the sealed volume is separated from the rest of the plasma chamber, the cleaning of the extraction plate and the cleaning of the plasma chamber may be performed independently. |
| priorityDate | 2016-10-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 50.