| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c667003ba24a316013640aa90f658cdc |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K2203-0723
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-24917 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D7-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-107
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D5-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D5-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-241 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25D5-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25D7-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25D5-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B32B3-00 |
| filingDate |
2017-11-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2020-05-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5b0bee0bcbd62061d5cf8642aa4a35f8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c9cae1a0c88f34887f6a33478b578915
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_735c8ec9f7a4c5e267d248054d263ba3 |
| publicationDate |
2020-05-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-10640879-B2 |
| titleOfInvention |
High aspect ratio electroplated structures and anisotropic electroplating processes |
| abstract |
Devices including high-aspect ratio electroplated structures and methods of forming high-aspect ratio electroplated structures are described. A method for manufacturing metal structures includes providing a substrate having a metal base characterized by a height to width aspect ratio A/B and electroplating a metal crown on the base to form the metal structure with a height to width aspect ratio A/S greater than the aspect ratio A/B of the base. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11521785-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11094458-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11387033-B2 |
| priorityDate |
2016-11-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |