| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a3d52eacd83e723ebd2ca61b598586c2 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67242
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N21-9501
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N21-956
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N21-8806
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L22-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L22-12 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N21-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N21-956
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N21-95
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N21-88 |
| filingDate |
2016-08-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2019-06-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cf8fdd6eb275d1e0c659920cc71b45fa
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_72fcfe3ef0746850c95060b0919697d0
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dbadeb433290907910635cd5cc34190f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_faaaeab3b3b3abfca4ebdccbed351daa
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_772c910194e2b5381f385f64c9c30e06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2ecca6ce884c803decbb82a146867b8c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4dcfafc12109d2df301334ca75fdde2f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_aa56663f7338b68344bf3567219d7416 |
| publicationDate |
2019-06-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-10324045-B2 |
| titleOfInvention |
Surface defect inspection with large particle monitoring and laser power control |
| abstract |
Methods and systems for reducing illumination intensity while scanning over large particles are presented herein. A surface inspection system determines the presence of a large particle in the inspection path of a primary measurement spot using a separate leading measurement spot. The inspection system reduces the incident illumination power while the large particle is within the primary measurement spot. The primary measurement spot and the leading measurement spot are separately imaged by a common imaging collection objective onto one or more detectors. The imaging based collection design spatially separates the image of the leading measurement spot from the image of the primary measurement spot at one or more wafer image planes. Light detected from the leading measurement spot is analyzed to determine a reduced power time interval when the optical power of the primary illumination beam and the leading illumination beam are reduced. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11143600-B2 |
| priorityDate |
2016-08-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |