| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bfbc437a4f291fa22eb097a86de8f3f8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_9e8cc3701ed4c4f042a7b88ebff70203
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_12c1e84e0d2e6962bd28914ad19f7181
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_0d9d8744f37a54da2a51fdf7b291ec69 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-042
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-165
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F20-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F292-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-452
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F26-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F271-02 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F271-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05D3-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-452
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F26-10 |
| filingDate |
2017-06-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2019-03-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d340853ffab942d161f4f0d1a50bf34f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3a7d143cc54ac91841e478d7b7d4a9d5
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f68d39195447fdcca6bd682cfe13ced0 |
| publicationDate |
2019-03-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-10221272-B2 |
| titleOfInvention |
Patterned polymers and directed polymer growth by intiated chemical vapor deposition |
| abstract |
A method of forming a patterned polymer layer on a substrate and a substrate having a polymer layer formed by the method. The method includes providing a substrate comprising a first surface having a first surface energy and a pattern located on the substrate forming a second surface having a second, lower surface energy than the first surface, and selectively depositing a polymeric layer onto the first surface using a monomer material in an initiated chemical vapor deposition process, wherein the initiated chemical vapor deposition process is operated under supersaturation conditions during the deposition process. |
| priorityDate |
2016-06-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |