Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_f20cb045e7a60c5b417b00b3d8053ee8 |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10K2101-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10K2101-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10K50-11 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10K71-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41M3-006 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-54 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L51-0013 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10K71-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-042 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41J2-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10K71-12 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L51-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-31 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-04 |
filingDate |
2017-03-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2019-01-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7f8dbb1184a23aad7c89b037d4cb3203 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5943076216bf651edb39db567d19cd84 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7c2ffed3eb96989855db915cb8179c7f http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dbf3a836e1edae4814c76edf7f71f0b9 |
publicationDate |
2019-01-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-10170701-B2 |
titleOfInvention |
Controlled deposition of materials using a differential pressure regime |
abstract |
Methods and devices for controlling pressures in microenvironments between a deposition apparatus and a substrate are provided. Each microenvironment is associated with an aperture of the deposition apparatus which can allow for control of the microenvironment. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11751468-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2021351350-A1 |
priorityDate |
2016-03-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |