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publicationDate 2019-01-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-10170321-B2
titleOfInvention Aluminum content control of TiAIN films
abstract Described are methods of depositing a titanium aluminum nitride film on a substrate surface with a controlled amount of carbon. The methods include exposing a substrate surface to a titanium precursor, a nitrogen reactant and an aluminum precursor with purges of the unreacted titanium and aluminum precursors and unreacted nitrogen reactants between each exposure.
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