Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C69-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C67-56 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C67-48 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C29-76 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C45-786 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-325 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0035 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C31-125 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C49-04 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C45-78 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C29-76 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C67-48 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C67-56 |
filingDate |
2015-10-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2018-10-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0942c5e039857f4e12377211c6861570 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a6eee15d9deb73366580a9b0cf40274b http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4fd220c8e594f4d931fdf5226b401ff4 |
publicationDate |
2018-10-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-10088752-B2 |
titleOfInvention |
Method for manufacturing organic processing fluid for patterning of chemical amplification type resist film, organic processing fluid for patterning of chemical amplification type resist film, pattern forming method, method for manufacturing electronic device, and electronic device |
abstract |
There is disclosed a method for manufacturing an organic processing fluid for patterning of a chemical amplification type resist film, comprising a step of causing a fluid containing an organic solvent to pass through a filtration device having a fluid input portion, a fluid output portion, and a filtration filter film provided in a flow path that connects the fluid input portion and the fluid output portion with each other, wherein an absolute value (|T I −T o |) of a difference between a temperature (T I ) of the fluid in the fluid input portion and a temperature (T o ) of the fluid in the fluid output portion is 3° C. or lower, a filtration speed of the fluid in the filtration device is 0.5 L/min/m 2 or greater, and a filtration pressure by the fluid in the filtration device is 0.10 MPa or lower. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11372331-B2 |
priorityDate |
2013-04-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |