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filingDate 2016-12-29-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2018-07-03-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2018-07-03-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-10014409-B1
titleOfInvention Method and structure to provide integrated long channel vertical FinFET device
abstract A vertical fin field effect transistor includes a semiconductor fin disposed over a well region and a gate conductor layer disposed over a sidewall of the fin, and extending laterally over a top surface of the well region adjacent to the fin. The extension of the gate conductor over the bottom source/drain effectively increases the channel length of the vertical FinFET device independent of the fin height. A bottom source/drain region is laterally adjacent to the well region such that the portion of the well region covered by the laterally extended gate stack is between the bottom source/drain region and the portion of the well region immediately under the fin. A top source/drain region is located above the fin. The device is operated in circuits by use of electrical contacts to the bottom source/drain, the gate conductor, and the top source/drain.
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