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filingDate 2006-08-21-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7929e4f203d39324263666708108d01f
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publicationDate 2007-08-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-M316492-U
titleOfInvention A liner suitable for covering the interior wall of a semiconductor processing chamber
abstract A coating has a cylindrical body (914) comprising upper and lower edges, and a flange extending radially outwards from the upper edge. A recess (932) is formed in an outer surface of the body. A slit (938) is arranged in the recess and passes through the body, where the body is coated by yttrium or yttrium oxide. A lip (918) extends from an inner surface of the body in a radially inward manner, where the lip has an upper surface.
priorityDate 2006-05-03-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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