| abstract |
The present invention relates to a positive photosensitive resin composition. More specifically, it relates to a) a 1,2-quinonediazide compound of the following chemical formula 1 or 2; b) an acrylic copolymer; c) a silane coupling agent ; And d) the solvent-based positive photosensitive resin composition: The chemical formula of R 1 1, R 2 of formula 3 are each independently a hydrogen atom or a 1,2-quinone diazide sulfonic acid ester type, the chemical formula R 1 2 of the formula R 4 2 are independently a hydrogen atom Or a hydrocarbon group having 1 to 20 carbon atoms , and at least one of R 1 and R 3 is a 1,2-quinonediazide sulfonate. |